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A597045-100mgAld-Ph-PEG2-t-butyl ester is a PEG derivative with a stable benzaldehyde group. The t-butyl ester can be removed under acidic conditions. The hydrophilic PEG chain increases the water solubility of the compound in aqueous media.
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A597045-1gAld-Ph-PEG2-t-butyl ester is a PEG derivative with a stable benzaldehyde group. The t-butyl ester can be removed under acidic conditions. The hydrophilic PEG chain increases the water solubility of the compound in aqueous media.
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A597045-250mgAld-Ph-PEG2-t-butyl ester is a PEG derivative with a stable benzaldehyde group. The t-butyl ester can be removed under acidic conditions. The hydrophilic PEG chain increases the water solubility of the compound in aqueous media.
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A597045-500mgAld-Ph-PEG2-t-butyl ester is a PEG derivative with a stable benzaldehyde group. The t-butyl ester can be removed under acidic conditions. The hydrophilic PEG chain increases the water solubility of the compound in aqueous media.
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A597048-100mgAld-Ph-PEG5-t-butyl ester is a hydrophilic PEG derivative with a benzaldehyde moiety and a t-butyl ester. The benzaldehyde can react with primary amine groups. The t-butyl ester is an acid labile protecting group. Upon removal the carboxylic acid
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A597048-1gAld-Ph-PEG5-t-butyl ester is a hydrophilic PEG derivative with a benzaldehyde moiety and a t-butyl ester. The benzaldehyde can react with primary amine groups. The t-butyl ester is an acid labile protecting group. Upon removal the carboxylic acid
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A597048-250mgAld-Ph-PEG5-t-butyl ester is a hydrophilic PEG derivative with a benzaldehyde moiety and a t-butyl ester. The benzaldehyde can react with primary amine groups. The t-butyl ester is an acid labile protecting group. Upon removal the carboxylic acid
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A597048-500mgAld-Ph-PEG5-t-butyl ester is a hydrophilic PEG derivative with a benzaldehyde moiety and a t-butyl ester. The benzaldehyde can react with primary amine groups. The t-butyl ester is an acid labile protecting group. Upon removal the carboxylic acid
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A487434-1kitDescriptionAldrich®Negative Photoresist Kit I consists of materials for photolithography. The photoresist can be spin coated on the glass substrate for the formation of electrode arrays. The kit also provides masking and patterning on the glass
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A434496-100gGeneral DescriptionAlginic acid sodium is a gelling and nontoxic anionic polysaccharide. The carboxylic acid groups on the alginic acid chain, renders it insoluble in water.However, converting alginic acid to its sodium form, enables it to
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A434496-250gGeneral DescriptionAlginic acid sodium is a gelling and nontoxic anionic polysaccharide. The carboxylic acid groups on the alginic acid chain, renders it insoluble in water.However, converting alginic acid to its sodium form, enables it to
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A434496-500gGeneral DescriptionAlginic acid sodium is a gelling and nontoxic anionic polysaccharide. The carboxylic acid groups on the alginic acid chain, renders it insoluble in water.However, converting alginic acid to its sodium form, enables it to