General description
Aldrich® Negative Photoresist Kit I consists of materials for photolithography. The photoresist can be spin coated on the glass substrate for the formation of electrode arrays. The kit also provides masking and patterning on the glass surface.
Application
Aldrich® Negative Photoresist Kit I has been used in the fabrication of microelectrodes by photolithography. It can also be used to fabricate the droplet-based microfluidic device, microfluidic chips, glass optical waveguides, and integrated grating couplers.
Legal Information
Aldrich is a registered trademark of Sigma-Aldrich Co. LLC
storage temp.: 2-8°C. Quality Level: 100. Pictograms: GHS05,GHS07,GHS08,GHS09. Signal Word: Danger. Hazard Statements: H302 + H312 + H332 - H304 - H314 - H335 - H351 - H360FD - H373 - H411. Precautionary Statements: P273 - P280 - P301 + P330 + P331 - P303 + P361 + P353 - P304 + P340 + P310 - P305 + P351 + P338. Hazard Classifications: Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Repr. 1B - Skin Corr. 1 - STOT RE 2 Inhalation - STOT SE 3. Target Organs: Respiratory system. Storage Class Code: 6.1C - Combustible, acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects. WGK: WGK 3. Flash Point(F): Not applicable. Flash Point(C): Not applicable.Shipping Information:
Hazmat Fee: $65.00 + applicable shipping charges are added after the order is placed.
More Information: https://cenmed.com/shipping-returns
- UPC:
- 41105312
- Condition:
- New
- Availability:
- 3-5 Days
- Weight:
- 1.00 Ounces
- HazmatClass:
- Yes
- MPN:
- 654892-1KT
