CVD & ALD Precursors

Tetramethyltin.

Tetramethyltin.

Applications：Thallium is used in method for detecting defect of thin film transistor array substrate. Also, used in preparation single-atom catalyst supported on Carbon support.

Thallium(I) hexafluoroacetylacetonate.

Thulium(III) 2,4-pentanedionate is used in low radiation detection for detection badges. It is used luminescence applications, such as halide discharge lamps.

Thulium(III) 2,4-pentanedionate is used in low radiation detection for detection badges. It is used luminescence applications, such as halide discharge lamps.

Thulium(III) 2,4-pentanedionate is used in low radiation detection for detection badges. It is used luminescence applications, such as halide discharge lamps.

Thulium(III) 2,4-pentanedionate is used in low radiation detection for detection badges. It is used luminescence applications, such as halide discharge lamps.

Thin film deposition by atomic layer deposition (ALD):Atomic layer etching:For use in transistors and other integrated circuit components.

Thin film deposition by atomic layer deposition (ALD):Atomic layer etching:For use in transistors and other integrated circuit components.

Tin(II) hexafluoroacetylacetonate.

Tin(II) hexafluoroacetylacetonate.