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H157333-25gHexachlorodisilane may be used as a reducing agent. Hexachlorodisilane may be combined with ammonia to form silicon nitride by chemical vapor deposition.
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H157333-5gHexachlorodisilane may be used as a reducing agent. Hexachlorodisilane may be combined with ammonia to form silicon nitride by chemical vapor deposition.
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H156952-1gHexadecamethylcyclooctasiloxane.
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H156952-250mgHexadecamethylcyclooctasiloxane.
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H404566-100mlHexadecyltriethoxysilane.
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H404566-25mlHexadecyltriethoxysilane.
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H404566-5mlHexadecyltriethoxysilane.
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H106567-100mlHexadecyltrimethoxysilane.
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H106567-25mlHexadecyltrimethoxysilane.
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H106567-500mlHexadecyltrimethoxysilane.
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H193411-1gHexamethyl diorthosilicate.
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H193411-25gHexamethyl diorthosilicate.