Organosilicon Reagents

Source material for vapor deposition during silicon carbide growth. Silylating reagent for allylic acetates, aryl halides, and diketones.

Source material for vapor deposition during silicon carbide growth. Silylating reagent for allylic acetates, aryl halides, and diketones.

Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane

Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane

Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane

Hexaphenylcyclotrisiloxane.

Hexaphenylcyclotrisiloxane.

Hexaphenyldisilane.

Hexaphenyldisilane.

Hexaphenyldisilane.

Hexaphenyldisilane.

Hexaphenyldisiloxane.