CHROMIUM ETCHANT STANDARD (C005B-231661)

Description

General description

Appearance - Clear orange

pH - Acidic

Etch Rate at 40 °C - 40 Å/second

Etch Capacity (rate declines at ~70%) - 65 g/gallon

Shelf Life - 1 year

Storage Conditions - Ambient

Filtration - 0.2 µm

Recommended Operating Temperatures - 20-80 °C (30-40 °C most common)

Rinse - Deionized water

Photoresist Recommendations - KLT6000 Series, KLT 5300 Series, HARE SQT (SU-8 type), TRANSIST, or PKP -308PI

Select Compatible Materials - Au, Ti, oxide, nitride, Si

Select Incompatible Materials - Al, Ni, Cu, NiCr

Compatible Plastics - HDPE, PP, PTFE, PFA, PVC

Isotropy - Isotropic

Incompatible Chemicals - Strong bases

Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.

Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.[1][2][3][4]

Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our chromium etchant is filtered to remove all particulates above 0.2 microns. Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well-ventilated hood.

Application

For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.

The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si3N4, SiO2, Ti, and W surfaces[5]

Features and Benefits

Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.