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Disilane

Sigma-Aldrich

Catalog No.
C15-1217-954
Manufacturer No.
463043-20G
Manufacturer Name
Sigma-Aldrich
Quantity
20
Unit of Measure
GR
Price: $3,197.80
List Price: $3,553.11

Atomic number of base material: 14 Silicon Application Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics. Features and Benefits Disilane is used for the deposition of amorphous silicon, epitaxial

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General description

Atomic number of base material: 14 Silicon

Application

Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.

Features and Benefits

Disilane is used for the deposition of amorphous silicon, epitaxial silicon and silicon based dielectrics via rapid low-temperature chemical vapor depsition (LTCVD). Disilane is also used in the epitaxial growth of SiGe films by molecular beam epitaxy (MBE) in conjunction with solid sources of germanium. Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.

UPC:
51111632
Condition:
New
Weight:
1.00 Ounces
HazmatClass:
No
WeightUOM:
LB
MPN:
463043-20G


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