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GF97661324-1EA
Platinum (C15-1197-712)
Price: $4,186.81List Price: $4,652.01For updated SDS information please visit www.goodfellow. -
GF98546990-1EA
Platinum (C15-1197-713)
Price: $881.14List Price: $979.05For updated SDS information please visit www.goodfellow. -
GF98546990-5EA
Platinum (C15-1197-714)
Price: $3,428.57List Price: $3,809.52For updated SDS information please visit www.goodfellow. -
GF98740435-1EA
Platinum (C15-1197-715)
Price: $2,505.49List Price: $2,783.88For updated SDS information please visit www.goodfellow. -
GF98759200-1EA
Platinum (C15-1197-716)
Price: $2,917.58List Price: $3,241.76For updated SDS information please visit www.goodfellow. -
GF99503477-1EA
Platinum (C15-1197-717)
Price: $2,818.68List Price: $3,131.87For updated SDS information please visit www.goodfellow. -
GF99566410-10EA
Platinum (C15-1197-718)
Price: $6,098.90List Price: $6,776.56For updated SDS information please visit www.goodfellow. -
GF99655701-1EA
Platinum (C15-1197-719)
Price: $1,780.22List Price: $1,978.02For updated SDS information please visit www.goodfellow. -
GF99967561-1EA
Platinum (C15-1197-720)
Price: $644.57List Price: $716.19For updated SDS information please visit www.goodfellow. -
P475380-5gDescription:Platinum on silica (Pt/SiO2) can be used for a variety of applications such as:a substrate for the preparation of zinc oxide (ZnO) nanopillar arraysan electrocatalyst for methanol oxidationin the formation of nanospheres for catalytic
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645605-2G
Trimethyl(methylcyclopentadienyl)platinum(IV) (C15-1293-672)
Price: $1,626.86List Price: $1,807.62Trimethyl(methyl cyclopentadienyl)platinum(IV) ( MeCpPtMe 3 ) is a commonly used organometallic precursor for platinum. Application MeCpPtMe 3 was used for the deposition of ultrathin metallic layers of platinum by electron beam induced deposition, -
697540-10G
Trimethyl(methylcyclopentadienyl)platinum(IV) (C15-1293-673)
Price: $7,829.67List Price: $8,699.63Trimethyl(methylcyclopentadienyl)platinum(IV) pale yellow or off-white crystalline organometallic complex widely used as a chemical vapor deposition/atomic layer deposition precursor to deposit platinum on various substrates. Application