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[(4R)-4-fluoro-1,2-dimethyl-pyrrolidin-2-yl]methanol (C09-1549-721)
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[(4R)-4-fluoro-1,2-dimethyl-pyrrolidin-2-yl]methanol (C09-1549-722)
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[(4R)-4-fluoro-1,2-dimethyl-pyrrolidin-2-yl]methanol (C09-1549-723)
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Price: $158.25List Price: $175.83CAS: 1344-28-1 EC No: 215-691-6 MDL No: MFCD00003424 3.2mm Pellets, S.A. 90 m2/g Molecular Formula: Al<sub>2</sub>O<sub>3</sub> MW: 101.96 Melting Point: 2040° -
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Price: $812.57List Price: $902.86This product is provided as delivered and specified by the issuing Pharmacopoeia. All information provided in support of this product, including SDS and any product information leaflets have been developed and issued under the Authority of the -
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Price: $812.57List Price: $902.86This product is provided as delivered and specified by the issuing Pharmacopoeia. All information provided in support of this product, including SDS and any product information leaflets have been developed and issued under the Authority of the -
Add to Cart The item has been added12401Ammonium Acetate, 500 g
Price: $126.06List Price: $140.06ACS REAGENT GRADE -
Add to Cart The item has been added19232AMMONIUM HYDROXIDE SOLUTION, 6 N, 4 L
Price: $255.79List Price: $284.21NH<sub>4</sub>OH -
Add to Cart The item has been addedLC111200-L01AMMONIUM HYDROXIDE, 6.0N (6.0M), 1L
Price: $161.25List Price: $179.17The LabChem 6.0 M ammonium hydroxide has a non-flammable formulation and is mainly used in laboratory and manufacturing factories. Application: For Laboratory and Manufacturing Use Only -
Add to Cart The item has been addedLC111200-M01AMMONIUM HYDROXIDE, 6.0N (6.0M), 500mL
Price: $112.07List Price: $124.52The LabChem 6.0 M ammonium hydroxide has a non-flammable formulation and is mainly used in laboratory and manufacturing factories. Application: For Laboratory and Manufacturing Use Only -
Add to Cart The item has been added725471-10GBis(methyl-eta5-cyclopentadienyl)methoxymethylzirconium (C15-1308-305)
Price: $1,978.02List Price: $2,197.80Atomic number of base material: 40 Zirconium Application Precursors Packaged for Depositions Systems Advanced precursor for atomic layer deposition of ZrO 2 thin films. Hafnium and zirconium oxides are leading candidates to replace silicion dioxide
