Graphene ink for spin/spray coating photonically annealable

DescriptionSpin-coating:Spin-coating a single layer at 2000-5000 rpm yields a final film thickness of 40-60 nm. To achieve thicker films, multiple layers can be applied without a baking step. This is recommended over using a lower spin speed to maintain film uniformity.Electrical performance:Following a baking step at 300 °C for 30 minutes in air, the spin-coated films exhibit sheet resistance of 300-800 Ω/sq, corresponding to a resistivity of 0.003-0.004 Ω−cm. With 5 coats at 2000 rpm, a 200 nm thick film with a sheet resistance of 160 Ω/sq. is obtained.General guidelines:Ethanol is recommended for cleaning up the ink and dried films, as well as dilution. Bath sonication (5-10 minutes) of the ink prior to use is recommended following extended periods of disuse. Specification: for spin-coating, spray-coating, photonic annealing Related Documents: https://ald-pub-files.oss-cn-shanghai.aliyuncs.com/aladdinsci/pdp/sds/1/G485796-SCI_6bb5d920779147a6beee6fad224ce120.pdf