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A333158-10gAluminum cerium oxide.
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A477832-1gAluminum cerium oxide.
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A433483-100gGeneral DescriptionAluminum chloride may be manufactured by chlorination of liquid aluminum in ceramic lined reaction vessels at 600-700 o C.ApplicationHigh strength steel has been coated electrochemically by Al in an acidic ionic liquid composed of
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A433483-500gGeneral DescriptionAluminum chloride may be manufactured by chlorination of liquid aluminum in ceramic lined reaction vessels at 600-700 o C.ApplicationHigh strength steel has been coated electrochemically by Al in an acidic ionic liquid composed of
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A433483-5gGeneral DescriptionAluminum chloride may be manufactured by chlorination of liquid aluminum in ceramic lined reaction vessels at 600-700 o C.ApplicationHigh strength steel has been coated electrochemically by Al in an acidic ionic liquid composed of
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A640112-100gIt is used to control excessive sweating. It is commonly used as a catalyst for the halogenation (especially chlorination) of aromatic groups, as well as in the Friedel Crafts reaction. It is also used in the Meerwein-Ponndorf-Verley reduction. It
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A640112-25gIt is used to control excessive sweating. It is commonly used as a catalyst for the halogenation (especially chlorination) of aromatic groups, as well as in the Friedel Crafts reaction. It is also used in the Meerwein-Ponndorf-Verley reduction. It
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A475217-100gAluminum chloride hydrate.
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A475217-25gAluminum chloride hydrate.
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A331501-100mlAluminum chloride THF complex.
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A477474-5gDescriptionMesoporous silica′s are inorganic materials that have porous structures and find applications in chromatography, catalysis, drug delivery and imaging. Carbon paste electrode (CPE) modified with Mesoporous Al-doped silica can be used for
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A487579-500mlDescriptionALUMINUM ETCHANT - TYPE AStandard aluminum etchant for use on silicon devices and other microelectronic applications.Aluminum etchants are stable, non-toxic preparations used to etch aluminum metallizations on silicon devices and in