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P475134-5gDescriptionReagent for the synthesis of ″dandelion″ (spherical) dendrimers. Ring-opening polymerization, ligand and/or ligand precursor for transition metals, and the study of P-Cl bond substitution reactions are among the interesting uses for this
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P433774-25gGene Informationhuman ... SRC(6714)General DescriptionAnhydrous phosphoric acid is a white solid which melts at 42.35 o C to form a viscous liquid. In aqueous solution phosphoric acid behaves as a triprotic acid, having three ionizable hydrogen
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P474217-10gDescriptionPhosphorus triiodide (PI3) is a trihalide of phosphorus that can be used as a deactivator and a deoxygenating agent.PI3is used in the synthesis of black phosphate crystal, which can be used as a semiconducting material for optoelectronic
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P433862-5gPhosphorus, red.
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S104615-1gSelenic acid is a strong oxidising agent. It reacts with gold to form gold selenate.
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S104615-25gSelenic acid is a strong oxidising agent. It reacts with gold to form gold selenate.
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S104615-5gSelenic acid is a strong oxidising agent. It reacts with gold to form gold selenate.
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S475223-50gDescriptionSelenous acid is a dibasic acid. It is the oxoacid of selenium and can be formed by adding selenium dioxide gas to water. Selenous acid shows analogy to sulfurous acid. As a crystalline solid, the molecules are arranged in a pyramid and
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S433067-5EAApplicationSiO 2 is majorly used as a substrate material with excellent thermo-mechanical properties in a variety of applications which include: vapour deposition phase deposition atomic force microscopy probes(AFM) spin coating electronic based
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T487601-500mlDescriptionEtchant solution for precise, clean etching of tantalum, tantalum nitride, and tantalum oxide thin films and resists in electronics applicationsPreparation instructionsEtch times vary depending on material type (Ta, TaN, or Ta2O5) and
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T487587-100mlDescriptionTungsten etchant is a mixture of potassium hydroxide and potassium ferricyanide based solution that facilitates the removal of tungsten and other materials like aluminium by dipping the substrate into the etching solution.Selective
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T487587-25mlDescriptionTungsten etchant is a mixture of potassium hydroxide and potassium ferricyanide based solution that facilitates the removal of tungsten and other materials like aluminium by dipping the substrate into the etching solution.Selective