Electronic Chemicals & Etchants

DescriptionTungsten etchant is a mixture of potassium hydroxide and potassium ferricyanide based solution that facilitates the removal of tungsten and other materials like aluminium by dipping the substrate into the etching solution.Selective

Tungstic acid.

Tungstic acid.

Tungstic acid.

DescriptionXenon fluoride may be obtained by interacting elemental xenon and fluorine in the temperature range of 473-523oC and 5 absolute atmosphere. Xenon difluoride readily interacts with Lewis acid and forms complexes.Very useful fluorination

DescriptionXenon fluoride may be obtained by interacting elemental xenon and fluorine in the temperature range of 473-523oC and 5 absolute atmosphere. Xenon difluoride readily interacts with Lewis acid and forms complexes.Very useful fluorination