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S432144-5gOther NotesMay contain adsorbed H 2 O and CO 2 which is removable by calcining at >:900°C.
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S110935-1gA high melting white solid used in high-temperature systems (for its resistance to heat and thermal shock), electronic ceramics, and glass composition. Suitable for vacuum deposition applications.
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S110935-25gA high melting white solid used in high-temperature systems (for its resistance to heat and thermal shock), electronic ceramics, and glass composition. Suitable for vacuum deposition applications.
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S110935-5gA high melting white solid used in high-temperature systems (for its resistance to heat and thermal shock), electronic ceramics, and glass composition. Suitable for vacuum deposition applications.
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S110872-100gUsually used as reactant involved in Intramolecular oxidative cyclization,Oxidative amidation of aldehydes,Synthesis of FeSe nanostructures via electrochemical deposition,Regioselective allylic oxidation, Synthesis of CdSe quantum dots,Selenium
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S110872-25gUsually used as reactant involved in Intramolecular oxidative cyclization,Oxidative amidation of aldehydes,Synthesis of FeSe nanostructures via electrochemical deposition,Regioselective allylic oxidation, Synthesis of CdSe quantum dots,Selenium
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S110872-5gUsually used as reactant involved in Intramolecular oxidative cyclization,Oxidative amidation of aldehydes,Synthesis of FeSe nanostructures via electrochemical deposition,Regioselective allylic oxidation, Synthesis of CdSe quantum dots,Selenium
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S131652-100gSilica micropowder.
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S131652-500gSilica micropowder.
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S292679-100gSilica micropowder.
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S292679-500gSilica micropowder.
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S431506-500gGeneral DescriptionFumed silica may be synthesized by high temperature hydrolysis of SiCl 4 in O 2 (N 2 )/H 2 flame. It is amorphous in nature and possesses very high specific area. The micro droplets of amorphous silica fuse into a branch and form