Solution & Vapor Deposition Precursors

Product Application:Gadolinium(III) acetate hydrate is used as a laboratory reagent, catalysts, optical glasses, structural ceramics, electrical components and photo-optical material.

DescriptionHafnium isopropoxide isopropanol adduct was used as a precursor to prepare mesoporous HfO2by the thermohydrolytic approach. The high active surface area and uniform porosity enables these HfO2to be used as adsorbents for sequestration of

Hafnium(IV) n-butoxide.

Hafnium(IV) n-butoxide.

Hafnium(IV) n-butoxide.

Hafnium(IV) n-butoxide.

General DescriptionAtomic number of base material: 72 Hafnium.

ApplicationHafnium tert -butoxide [Hf(OtBu) 4 ] is a mononuclear: volatile: and highly promising precursor for the deposition of HfO 2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric

Holmium(III) acetate hydrate.

Holmium(III) acetate hydrate.

Holmium(III) acetate hydrate.

Holmium(III) acetate hydrate.