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P124121-1gUsed in a redox transmetalation reaction to enhance CVD alloying technology for copper. Also used in the simultaneous etching of copper and deposition of palladium for applications in ultra large-scale integrated devices.
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P124121-250mgUsed in a redox transmetalation reaction to enhance CVD alloying technology for copper. Also used in the simultaneous etching of copper and deposition of palladium for applications in ultra large-scale integrated devices.
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P124121-5gUsed in a redox transmetalation reaction to enhance CVD alloying technology for copper. Also used in the simultaneous etching of copper and deposition of palladium for applications in ultra large-scale integrated devices.
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P349489-1gPalladium(II) propionate.
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P432283-5gGeneral DescriptionAtomic number of base material: 73 Tantalum.
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P108327-25gPotassium acetate.
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P108327-5gPotassium acetate.
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P421118-1mlPotassium acetate.
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P472322-10gPotassium dichloroacetate.
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P434283-25gGeneral DescriptionTotal impurities: may contain up to 5,000 ppm Sodium Potassium tert-butoxide is a strong alkoxide base, it can deprotonate carbon and other Brφnsted acids. It is a relatively poor nucleophile.ApplicationMizoroki-Heck-Type
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P434283-5gGeneral DescriptionTotal impurities: may contain up to 5,000 ppm Sodium Potassium tert-butoxide is a strong alkoxide base, it can deprotonate carbon and other Brφnsted acids. It is a relatively poor nucleophile.ApplicationMizoroki-Heck-Type
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P465776-25gPraseodymium(III) acetylacetonate hydrate.