Silicon dioxide (C09-1045-367)

ApplicationSiO 2 is majorly used as a substrate material with excellent thermo-mechanical properties in a variety of applications which include: vapour deposition phase deposition atomic force microscopy probes(AFM) spin coating electronic based devicesOther Notesspecific heat = 0.18 cal/g; thermoelectric constant = 1200μV/°C @ 300 °C; thermal conductivity = 0.0033 cal/cm°C; themal expansion (x10 -6 ) = α 11 : 13.71, α 33 : 7.48; Q value = 1.8 × 10 6 min; acoustic velocity, SAW = 3160 m/sec; frequency constant, BAW = 1661 kHz/mm; piezoelectric coupling = K 2 BAW: 0.65%, SAW: 0.14%. Specification: single crystal substrate, optical grade, 99.99% trace metals basis, L × W × thickness 10 mm × 10 mm × 0.5 mm Molecular Formula: SiO2 Molecular Weight: 60.08 EC Number: 262-373-8 PubChem CID: 24261 Isomeric SMILES: O=[Si]=O Related Documents: https://ald-pub-files.oss-cn-shanghai.aliyuncs.com/aladdinsci/pdp/sds/1/S433067-SCI_d7b2b879e5c9a8c76ecfacc0107edc7f.pdf