General description
Tetrakis(diethylamido)tin(IV) is a volatile compound with four exchangeable ligands. It is widely used as a precursor to produce metal oxide thin films by the chemical vapor deposition method.
Application
Tetrakis(diethylamido)tin(IV) can be used:
- As a precursor to synthesize mesoporous tin silicate xerogels via non-hydrolytic templated sol–gel synthesis. These xerogels are potential catalysts for aminolysis and for the Meerwein–Ponndorf–Verley reduction.
- To produce stable metal oxide thin films on the surface of carbon electrode materials.
- To fabricate an ultrathin layer of SnO2 on carbon nanotubes, which can be used as anodes for lithium-ion batteries. This ultrathin layer helps to enhance the cycling stability and rate capability of anodes.
Shipping Information:
Hazmat Fee: $65.00 + applicable shipping charges are added after the order is placed.
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- UPC:
- 51242316
- Condition:
- New
- Availability:
- 3-5 Days
- Weight:
- 1.00 Ounces
- HazmatClass:
- Yes
- MPN:
- 397326-5G
- CAS:
- 1066-78-0
- Temperature Control Device:
- Yes
