Atomic number of base material: 40 Zirconium Application Zirconium source precursor for good quality MOCVD of PNZT. Features and Benefits Precursor for zirconia thin films, with deposition at lower temperatures promoted by Pd(hfac) 2 , or
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Atomic number of base material: 40 Zirconium
Zirconium source precursor for good quality MOCVD of PNZT.
Precursor for zirconia thin films, with deposition at lower temperatures promoted by Pd(hfac)2, or yttria-stabilized zirconia films on silicon and on stainless steel substrates. Zirconium source precursor for good quality MOCVD of PNZT.
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Sigma Aldrich
Sigma Aldrich
Sigma Aldrich
Sigma Aldrich
