Chromium (C007B-103421)

ApplicationSputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques. Specification: sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.95% trace metals basis Molecular Formula: Cr Molecular Weight: 52 EC Number: 231-157-5 PubChem CID: 23976 Isomeric SMILES: [Cr] Related Documents: https://ald-pub-files.oss-cn-shanghai.aliyuncs.com/aladdinsci/pdp/sds/1/C434741-SCI_5e44b426697f4a775d5117d1a6c7f7d5.pdf

UPC:

60104505

Condition:

New

Weight:

0.00 Ounces

HazmatClass:

No

Quantity:

1

Unit of Measurement:

EA

WeightUOM:

LB

MPN:

C434741-1EA

CAS:

7440-47-3

Product Size:

1EA