HYDROFLUORIC ACID 48 WT. % IN WATER >=99.99% METALS BASIS (C005B-078370)

General description

Hydrofluoric acid (HF) is the 48% solution of HF in water. It is weakly acidic in nature. Aqueous HF is mostly used in etching silicon in semiconductors and producing inorganic fluoride compounds. HF can also be used as fluorinating and deprotecting agent. As fluorination agent it also forms complexes with organic bases.

Application

Hydrofluoric acid is used:

• To compose the electrolyte for the synthesis of TiO₂ nanotube arrays.
• As etchant for the glass fibers.
• As capping reagent for the synthesis of anatase TiO₂ nanocrystals/nanosheets.

Shipping Information:

Hazmat Fee: $65.00 + applicable shipping charges are added after the order is placed.

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UPC:

51172829

Condition:

New

Weight:

1.00 Ounces

HazmatClass:

Yes

Quantity:

100

Unit of Measurement:

ML

MPN:

339261-100ML

CAS:

7664-39-3

Temperature Control Device:

Yes