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T432214-10g
Aladdin
Tris(diethylamido)(tert-butylimido)tantalum(V) (C09-1075-173)
Price: $6,309.12List Price: $7,010.13General DescriptionAtomic number of base material: 73 TantalumApplicationPrecursors Packaged for Depositions Systems. -
T475012-5ml
Aladdin
Tris(diethylamido)(tert-butylimido)tantalum(V) (C09-1076-192)
Price: $1,538.28List Price: $1,709.20DescriptionAtomic number of base material: 73 Tantalum. -
T475197-100mgDescriptionAtomic number of base material: 51 Antimony.
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T475197-1gDescriptionAtomic number of base material: 51 Antimony.
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T475197-250mgDescriptionAtomic number of base material: 51 Antimony.
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T432153-25gApplicationTris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride: carbonitride: nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions
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T476342-5g
Aladdin
Tris(ethylmethylamido)(tert-butylimido)tantalum(V) (C09-1076-420)
Price: $661.08List Price: $734.53DescriptionAtomic number of base material: 73 Tantalum. -
T432249-25gGeneral DescriptionTris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.ApplicationTris(tert-alkoxy)silanols
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T432249-5gGeneral DescriptionTris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.ApplicationTris(tert-alkoxy)silanols
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T432250-25gGeneral DescriptionAtomic number of base material: 14 SiliconApplicationPrecursors Packaged for Depositions Systems.
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T432242-5gTris(tert-pentoxy)silanol.
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T432243-25gGeneral DescriptionAtomic number of base material: 14 SiliconApplicationPrecursors Packaged for Depositions Systems.