Tris(tert-butoxy)silanol (C007B-300143)

General DescriptionTris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.ApplicationTris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH 3 ) 2 ) 4 ) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates. Specification: 0.99999 Molecular Formula: C12H28O4Si Molecular Weight: 264.43 PubChem CID: 316157 Isomeric SMILES: CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C Related Documents: https://ald-pub-files.oss-cn-shanghai.aliyuncs.com/aladdinsci/pdp/sds/1/T432249-SCI_2f133734529bb8874ea93955fa1ccc23.pdf

UPC:

51362407

Condition:

New

Weight:

1.13 Ounces

HazmatClass:

No

Quantity:

1

Unit of Measurement:

EA

WeightUOM:

LB

MPN:

T432249-5g

CAS:

18166-43-3

Product Size:

5g

Hazard Statement Codes:

H302:H315:H319:H335

Precautionary Statement Codes:

P261:P264:P271:P280:P321:P337:P302+P352:P304+P340:P305+P351+P338:P362+P364:P405:P403+P233:P501