Tetraethyl orthosilicate (C007B-300281)

ApplicationTetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of: Si oxide Oxycarbide Doped silicate Silanol Siloxane polymer Organosilicon thin films The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties. Commonly used as a precursor to prepare xerogel Will interact with dodecylamine in the formation of intercalation compounds of H + -magadiite and used in a study of mixed-metal bioactive glasses. Specification: Encapsulation for Deposition Systems Molecular Formula: C8H20O4Si Molecular Weight: 208.33 EC Number: 201-083-8 PubChem CID: 6517 Isomeric SMILES: CCO[Si](OCC)(OCC)OCC Beilstein Registry Number: 1422225 Related Documents: https://ald-pub-files.oss-cn-shanghai.aliyuncs.com/aladdinsci/pdp/sds/1/T434182-SCI_72b3f71086e24bb50284d8ae0c3e13a3.pdf

UPC:

12352310

Condition:

New

Weight:

1.92 Ounces

HazmatClass:

No

Quantity:

1

Unit of Measurement:

EA

WeightUOM:

LB

MPN:

T434182-25ml

CAS:

78-10-4

Product Size:

25ml

Hazard Statement Codes:

H226:H319:H332:H335

Precautionary Statement Codes:

P210:P233:P240:P241:P242:P243:P261:P264:P271:P280:P303+P361+P353:P305+P351+P338:P337+P313:P370+P378:P405:P403+P233:P403+P235:P501:P304+P340+P312