Application
Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:
- Si oxide
- Oxycarbide
- Doped silicate
- Silanol
- Siloxane polymer
- Organosilicon thin films
The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.
Commonly used as a precursor to prepare xerogel
Will interact with dodecylamine in the formation of intercalation compounds of H+-magadiite and used in a study of mixed-metal bioactive glasses.
- UPC:
- 51452501
- Condition:
- New
- Weight:
- 1.00 Ounces
- HazmatClass:
- No
- WeightUOM:
- LB
- MPN:
- 759414-25ML