TETRAETHYL ORTHOSILICATE PACKAGED FOR USE IN DEPOSITION SYSTEMS (C005B-080512)

Application

Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:

• Si oxide
• Oxycarbide
• Doped silicate
• Silanol
• Siloxane polymer
• Organosilicon thin films

The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.

Commonly used as a precursor to prepare xerogel

Will interact with dodecylamine in the formation of intercalation compounds of H⁺-magadiite and used in a study of mixed-metal bioactive glasses.

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UPC:

12352310

Condition:

New

Weight:

1.00 Ounces

HazmatClass:

Yes

Quantity:

25

Unit of Measurement:

ML

MPN:

759414-25ML

CAS:

78-10-4